Organosilicon and -germanium Chemistry

The research is focussed on the design, synthesis and characterization of new precursors for the gas phase deposition (CVD) of thin films of amorphous silicon (a:Si), its C- and Ge-alloys, of silicon nitride, oxide, silicones and silicates for photovoltaic, photosensoric and microelectronic devices.


Recent Publications in this Field of Research


back to homepage
Annette Schier, March 2000